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Machine Learning-Based Modelling in Atomic Layer Deposition Processes

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Hardback
15 December 2023
$486.64
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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

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    Book Details
    ISBN-13
    9781032386706
    Author
    Oluwatobi Adeleke
    Publisher
    Taylor & Francis Ltd
    Published
    15 December 2023
    Format
    Hardback

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    $486.64
    Ships in 3-5 business days
    Hurry up! Current stock:

    Machine Learning-Based Modelling in Atomic Layer Deposition Processes

    $486.64

    Description

    This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

    You Can Find This Book In

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